High-temperature creep and kinetic decomposition of Ni2SiO4 |
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| Authors: | J Wolfenstine D L Kohlstedt |
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| Institution: | 1. Department of Materials Science and Engineering, Cornell University, 14853, Ithaca, NY, USA
3. Department of Geology and Geophysics, University of Minnesota, 55455, Minneapolis, MN, USA
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| Abstract: | To investigate high-temperature creep and kinetic decomposition of nickel orthosilicate (Ni2SiO4), aggregates containing  3 vol% amorphous SiO2 have been deformed in uniaxial compression at a total pressure of one atomsphere. Twenty-three samples with grain sizes (d) from 9 to 30  m were deformed at temperatures (T) from 1573 to 1813 K, differential stresses ( ) from 3 to 20 MPa, and oxygen fugacities (f
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2) from 10-1 to 105 Pa. At temperatures up to 1773 K, the steady-state creep rate ( ) can be described by the flow law
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![$$\dot \varepsilon = 4.0{\text{ x }}10^8 \frac{{\sigma ^{1.1} }}{{d^{2.7} }}f_{O2}^0 {\text{ exp }}\left( {\frac{{ - 410kJ/mol}}{{RT}}} \right)\left {s^{ - 1} } \right]$$](/content/H570H02736171411/269_2004_Article_BF00202137_TeX2GIFE1.gif)