Degradation of Phenol in Aqueous Solution by Fenton,Sono‐Fenton and Sono‐photo‐Fenton Methods |
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| Authors: | Arjunan Babuponnusami Karuppan Muthukumar |
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| Institution: | 1. Department of Chemical Engineering, Adhiparasakthi Engineering College, Melmaruvathur, India;2. Department of Chemical Engineering, Alagappa College of Technology Campus, Anna University Chennai, Chennai, India |
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| Abstract: | The present work focuses on the performance of Fenton, sono‐Fenton, and sono‐photo‐Fenton processes for the oxidation of phenol present in aqueous solution. The effects of H2O2 concentration, Fe2+ concentration, pH, and initial phenol concentration on the oxidation of phenol were studied. The optimum Fe2+ and H2O2 concentrations for the Fenton process were 45 and 800 mg/L, respectively. For the sono‐Fenton process, the optimum Fe2+ and H2O2 concentrations were 30 and 800 mg/L, respectively. The optimal conditions for the sono‐photo‐Fenton process were found to be 20 mg/L of Fe2+ and 700 mg/L of H2O2. The optimum pH was found to be 3 for the processes investigated in the present study. The analysis of results showed that the sono‐photo‐Fenton method reduced the Fe2+ concentration by 30–50% and the H2O2 concentration by 12.5%. It was found that the sono‐photo‐Fenton technique showed better performance than the Fenton and sono‐Fenton processes for the oxidation of phenol. A lumped kinetic model was used to predict the chemical oxygen demand reduction and the model was found to fit the data. |
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| Keywords: | Fenton Kinetics Phenol Sono‐Fenton Sono‐photo‐Fenton |
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