A numerical diffusion model for continuous releases |
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| Authors: | C J P Van Buijtenen J Holland D Van Leeuwen |
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| Institution: | (1) Chemical Laboratory TNO, Rijswijk (Z.H.), The Netherlands;(2) Present address: Philips Electrologica N.V., Apeldoorn, The Netherlands |
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| Abstract: | The purpose of this study was to develop a diffusion model for a continuous point source which takes into account the increase
of wind speed with height, and to compare this model with short-range diffusion experiments. The main problem was to find
a good expression for the vertical diffusion coefficient. It turned out that good agreement between theory and experiment
could only be obtained by introducing a settling speed W for the tracer combined with a conventional expression for the vertical diffusion (K(Z) = K
0Z1−p). An empirical relation was found between K
0 and τ
vU and between W and bar
σ
vU2. |
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| Keywords: | |
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