Surface study of HF- and feldspar using Auger electron spectroscopy |
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| Authors: | Dale L Perry Leon Tsao Kenneth A Gaugler |
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| Institution: | Earth Sciences Division U.S.A.;Materials and Molecular Research Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720 U.S.A. |
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| Abstract: | Auger electron spectroscopy has been used to study K-feldspar that has been reacted with both aqueous 10% HF and a 50% mixture of a 10% HF/0.1 N H2SO4 solution. In the feldspar/HF system, the resulting feldspar surface was shown to have been fluorinated; depth profiling, using argon ion sputtering, showed the fluorination to have occurred substantially into the mineral bulk. In the feldspar/ system, the resulting surface contained both fluorine and sulfur. The fluorination had again penetrated into the bulk, but the sulfur could be removed with mild argon ion sputtering. The signal ratio was much lower on the feldspar surface treated with the 10% HF/0.1 N H2SO4 solution than the feldspar surface treated with the weaker 10% HF acid solution. |
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| Keywords: | Author to whom correspondence should be addressed |
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